Micron powders ISO 13320:2020
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CMP polishing, sapphire, silicon
Nano fractions 50–300 nm for CMP polishing of semiconductor substrates, sapphire, SiC. Ultra-high purity, agglomeration control, low defect count.
Processing electronics industry materials (sapphire substrates for LEDs, SiC wafers, Al₂O₃ and AlN ceramics, display glass) requires precision diamond tools and micron powder with nanometer accuracy. The roughness of the processed surface directly affects the electrical characteristics of semiconductor devices, so micron powder purity and consistency are paramount.
For the electronics industry, metallic impurity content is critical: Fe, Ni, Co can migrate into semiconductor structures and cause current leakage. Our PCD micron powder has total Fe+Ni+Co < 65 ppm, meeting requirements for semiconductor material processing. Every batch passes magnetic inclusion (< 0.1%) and particle size testing. For high-requirement operations, we offer additional purification and certification on request.
Read about Fe, Ni, Co impurity impact on micron powder quality in our dedicated article.
Premium PCD-grade micron powders, high thermal stability, narrow distribution, low impurities, custom made. Learn more →
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